The POREfessional Deep Retreat Pore-Clearing Clay Mask Benefit

The POREfessional Deep Retreat Pore-Clearing Clay Mask by Benefit is a wash off clay mask that offers a smoothing finish and is designed to clear large pores with a refined, cleansing texture. It works gently to clear impurities and refine skin texture, making it a thoughtful addition to your skincare routine.

• All

• Dryness & Dehydration
• Aging & Fine Lines
• Redness & Sensitivity

• Hydrating
• Repair and Protect
• Soothing

• Mask Wash Off

• Niacinamide - Balances skin by regulating oil, helping minimise pore appearance and improve uneven tone.
• Salicylic Acid - Clears and refines pores by penetrating oil, helping reduce breakouts and blackheads.

Apply evenly to clean, dry face & neck weekly. Leave on for 30 minutes or until dry. Dots appear as oil is drawn out of pores. Rinse. Avoid eye and mouth areas. In the event of contact with eyes, rinse immediately with water.

AQUA (WATER), KAOLIN, SILICA, GLYCERIN, BUTYLENE GLYCOL, PENTYLENE GLYCOL, CI 77007 (ULTRAMARINES), PEG-40 SORBITAN PEROLEATE, SODIUM ACRYLATES COPOLYMER, CAPRYLIC/CAPRIC TRIGLYCERIDE, CI 77499 (IRON OXIDES), HYDROXYACETOPHENONE, LECITHIN, MICA, CHLORPHENESIN, BISABOLOL, CI 77491 (IRON OXIDES), HYDROGENATED VEGETABLE OIL, OPUNTIA COCCINELLIFERA FLOWER EXTRACT, CI 77891 (TITANIUM DIOXIDE), TRISODIUM ETHYLENEDIAMINE DISUCCINATE, SIMMONDSIA CHINENSIS (JOJOBA) SEED OIL, PRUNUS DOMESTICA SEED OIL, PARFUM (FRAGRANCE), DISODIUM PHOSPHATE, POTASSIUM HYDROXIDE, XANTHAN GUM, CRITHMUM MARITIMUM EXTRACT, 1,2-HEXANEDIOL, CAPRYLYL GLYCOL, TOCOPHEROL, CI 77510 (FERRIC FERROCYANIDE), SODIUM PHOSPHATE, SPHINGOLIPIDS, SPHINGOMONAS FERMENT EXTRACT, TOCOPHERYL ACETATE, CITRIC ACID, PENTAERYTHRITYL TETRA-DI-T-BUTYL HYDROXYHYDROCINNAMATE, SODIUM CITRATE. N° 16588 PRODUCT INGREDIENT LISTINGS ARE UPDATED PERIODICALLY. BEFORE USING A BENEFIT PRODUCT, PLEASE READ THE INGREDIENT LIST ON THE PACKAGING OF YOUR PRODUCT TO BE SURE THAT THE INGREDIENTS ARE APPROPRIATE FOR YOUR PERSONAL USE.